Hitachi HF-3300S ETEM
Environmental transmission electron microscope, specially designed to study the growth of III-V semiconductor nanostructures. The microscope is equipped with a cold field-emission gun and CEOS B-COR aplanatic Cs corrector for imaging which results in an attainable resolution of 86pm at 300kV. A GATAN OneView IS camera is used for imaging and video capture, unbinned 4k-by-4k frames up to 25fps, or binned up to 300fps (512-by-512).
The microscope can be operated at 100kV, 200kV and 300kV acceleration voltages.
Attainable resolution in STEM is 0.20nm (BF-STEM at 300kV). For STEM imaging, three detectors are available: bright-field detector (BF), high angle annular dark field detector (HAADF) and secondary electron detector.
For analysis of chemical composition, the microscope is equipped with an SDD-based XEDS system (Oxford AZtec Advanced EDS, 80mm2 SDD detector with Moxtek AP X-ray window).
A gas handling system capable of handling nine different precursors is connected to the microscope, either via a dual nozzle injection port on the side of the microscope column or via specially designed gas injection heating holders with one or two gas lines with outlet(s) at the holder tip. Maximum pressure at the sample is 10Pa. An optional lid for the gas injection holder allows higher pressures, up to a few hundreds Pa. Sample heating is done using MEMS chips. Precursors presently installed are H2, N2, O2, trimethylaluminium (TMAl), trimethylgallium (TMGa), trimethylindium (TMIn), trimethylantimony (TMSb), arsine (AsH3) and phosphine (PH3).